Reference Sources
Reference sources are compact signal sources that facilitate the calibration of EMC test equipment.
The Radiated source (ERS) will check both the site and the measurement equipment. This is particularly important as the greatest source of measurement uncertainty is invariably the site.
All references sources are supplied complete with calibration data which is traceable to NPL (UK).

Small, self contained comb source which generates a known, stable field strength at the standard measurement distance of 3m.
These sources ensure measurement integrity and reduce measurement uncertainty.
- Obtain true end-to-end calibration including site conditions, antenna and receiver
- Frequency range from 30MHz to 1GHz
- Ultra-stable emission level with traceable calibration
- RF output: From detachable antenna.
- RF signal: Continuous, steady state, narrow band, harmonic series.
- Amplitude stability: 0.5dB (short term)
- Drift over time: 1dB/annum
- Harmonic spacing 2MHz
- Frequency range: 30MHz—1GHz
- Frequency stability: 80ppm
- RF level at 3m 50—73 dBuV/m
- Power: Internal battery (LiMH)
- Running time: 6 hours
Reduce Measurement Errors
By correlation between the results on your site and the calibration data supplied with these sources, errors due to site distortions and instrumentation error are quantified and can be compensated.
Site Flexibility
If your site is somewhat ‘less than ideal’ then these sources compensate for the unwanted reflections, lack of ground plane and any other influences that may reduce result integrity.
Self-Contained
These units are shipped complete with antenna, battery, charger and calibration data. Their small size make them ideal for spot checks and enclosure screening trials.
An annual re-calibration service is available. This calibration maintains the traceability to NPL
Long term monitoring of annual calibration results over the past 8 years have shown that these sources have exceptional long term stability, with changes less than the measurement uncertainty of the calibration process.